Trusted measurements for pressure, temperature, humidity, and liquid concentration measurements for increased yield, safety, and best-performing products
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Top-notch silicon chips are made using sophisticated machines, processes, and knowledge. And behind successful processes are high-performing monitoring and measurement instrumentation.
Each silicon chip deserves to work as intended, and when created, using just the right amount of material, energy, and other resources.
From semiconductor wafer manufacturing, and microelectronics fabrication to packaging semiconductors, equip your critical processing steps with trusted and reliable measurements for stable quality, high yield, predictability, and cost-efficiency.
Our offering covers instruments measuring humidity, dew point, temperature, pressure, and wet chemistries’ concentrations. Each product produces precise data on the manufacturing environment, and provides superior accuracy, long-term stability, and rapid response time for process optimization, increased yield, safety and best-performing chips.
For these reasons, Vaisala is the preferred measurement partner for semiconductor manufacturers and MEMS foundries, semiconductor equipment manufacturers and OEMs, fab operators, and material suppliers.
From the front-end to back-end and all the way to the customer, we've got you.
Humidity levels can also impact the semiconductor manufacturing process. Excessive humidity can lead to condensation on sensitive equipment, potentially causing defects in the semiconductor devices. Precision air conditioning systems help to control humidity levels and act as a preventative tool.
Wafer cleaning is a critical process in semiconductor manufacturing for removing contaminants, particles, and residues from the surface of silicon wafers. This process ensures the reliability and functionality of integrated circuits (ICs) and other semiconductor devices.
Cleaning agents can include acids, various solvents, and water, and these residues might be present, thus requiring extra durability from measurement probes.
Vaisala offers corrosive resistant probes also without metal wetted parts, specially tailored for the wafer cleaning process, tolerating both high humidity and harsh chemicals.
It is important to ensure chip dryness after cleaning to prevent contamination and particle adhesion.
Wafer stepper in photolithography is another critical processing step in the production of integrated circuits (ICs) and other semiconductor devices. In this step, a light pattern is projected onto a silicon wafer coated with photosensitive material (photoresist), thereby etching the desired pattern onto the wafer. As a result, some photolithography areas may have humidity tolerances as tight as ±1%.
Quality measurement probes in steppers offer stable temperature measurements and safeguard wafers from having variations in dimensions of the patterns induced by temperature fluctuations. Wrong dimensions on wafer patterns adversely affect the overall quality and performance of the semiconductor devices.
The wafer stepper relies on precise optics to project and transfer patterns onto the wafer. Any variations in temperature or other environmental conditions can affect the stability and accuracy of these optics.
Measuring barometric pressure is a must for optical precision and accuracy of the lithography process as barometric pressure directly influences the refractive index of air, which in turn affects the optics of the wafer stepper and the wavelength of lithography light.
Prevent defocused images by measuring and controlling barometric pressure with fast and accurate measurement instruments.
The wafer probing machines identify defective wafers by testing chips. Tests are performed in cold temperatures, up to -40 Celsius ( -40 Fahrenheit) to ensure the chip works in extreme temperatures, for example, if later intended to be used in a vehicle.
The test environment must be kept dry, with the dew point temperature under -40 so that there is no ice deposition on the chip, which would later, when transferred to room temperature, turn to water and collect impurities on the chip.
Vaisala offers accurate dew point probes for the chip prober machines.
Protect expensive process gases from being contaminated by humidity. Gas quality significantly affects chip quality, as even trace impurities can lead to defects or failures. Moisture can react with certain materials or introduce defects during processes like oxidation.
A rapidly reacting probe will detect any moisture quickly and alert when reaching the set limit.
Easily keep the cleanroom differential pressure at ISO 14644 standards with our sensitive probes. With Vaisala's modular Indigo system, you can connect your differential pressure and humidity measurement probes to the same Indigo transmitter.
Get to know our differential pressure probes PDT101 and PDT102.
Semiconductor wafer plants consume tons of chemicals throughout the fab process. Ensure reliability of each chemical and avoid deviations from specification that can result in expensive equipment contamination and wafer scrap.
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