Post-etch residue removal with EKC® chemicals The post-etch residual polymer removal process cleans polymers from the surface of wafers. This is done in the spray solvent tool, where a commonly used post-etchant chemical, EKC®, is fed to. EKC® post-clean treatments It is very important to keep the EKC® solution in tight specification as too much water in the solution risks corroding the system, and too little water in solution does not efficiently remove the polymers. Vaisala K-PATENTS® Semicon Refractometer offers 2 different control strategies either to automate chemical refilling or automate spiking after each wafer run, and warrant safe wafer production. The semicon refractometer can also alert the potential EKC® traces in IPA before IPA gets contaminated with EKC® in the following IPA/dry process. Fabs can achieve clear benefits using a semicon refractometer: Increase wafer throughput and reduce EKC® consumption. Use a semicon refractometer as a watch-dog for different chemicals and prevent them from mixing. Vaisala’s application note explains how a semicon refractometer can improve process with recommended installation points for best performance. EKC® is a registered trademark of E. I. du Pont de Nemours and Company. Download the application note (PDF) by filling the form. Discover all applications in Fab chemical process monitoring and fault detection Image Email Address*First Name*Last Name*Country*--Please Select--United StatesUnited KingdomCanadaChinaIndiaJapanAustraliaBrazilFranceGermanyFinland--------------AfghanistanÅland IslandsAlbaniaAlgeriaAmerican SamoaAndorraAngolaAnguillaAntarcticaAntigua and BarbudaArgentinaArmeniaArubaAustraliaAustriaAzerbaijanBahamasBahrainBangladeshBarbadosBelarusBelgiumBelizeBeninBermudaBhutanBoliviaBosnia and HerzegovinaBotswanaBouvet IslandBrazilBrit/Indian Ocean Terr.Brunei DarussalamBulgariaBurkina FasoBurundiCambodiaCameroonCanadaCape VerdeCayman IslandsCentral African RepublicChadChileChinaChristmas IslandCocos (Keeling) IslandsColombiaComorosCongoCongo, The Dem. Republic OfCook IslandsCosta RicaCôte D'IvoireCroatiaCubaCyprusCzech RepublicDenmarkDjiboutiDominicaDominican RepublicEcuadorEgyptEl SalvadorEquatorial GuineaEritreaEstoniaEthiopiaFalkland IslandsFaroe IslandsFijiFinlandFranceFrench GuianaFrench PolynesiaFrench Southern Terr.GabonGambiaGeorgiaGermanyGhanaGibraltarGreeceGreenlandGrenadaGuadeloupeGuamGuatemalaGuineaGuinea-BissauGuyanaHaitiHeard/McDonald Isls.HondurasHong KongHungaryIcelandIndiaIndonesiaIranIraqIrelandIsraelItalyJamaicaJapanJordanKazakhstanKenyaKiribatiKorea (North)Korea (South)KuwaitKyrgyzstanLaosLatviaLebanonLesothoLiberiaLibyaLiechtensteinLithuaniaLuxembourgMacauMacedoniaMadagascarMalawiMalaysiaMaldivesMaliMaltaMarshall IslandsMartiniqueMauritaniaMauritiusMayotteMexicoMicronesiaMoldovaMonacoMongoliaMontenegroMontserratMoroccoMozambiqueMyanmarN. Mariana Isls.NamibiaNauruNepalNetherlandsNetherlands AntillesNew CaledoniaNew ZealandNicaraguaNigerNigeriaNiueNorfolk IslandNorthern IrelandNorwayOmanPakistanPalauPalestinian Territory, OccupiedPanamaPapua New GuineaParaguayPeruPhilippinesPitcairnPolandPortugalPuerto RicoQatarReunionRomaniaRussian FederationRwandaSaint Kitts and NevisSaint LuciaSamoaSan MarinoSao Tome/PrincipeSaudi ArabiaSenegalSerbiaSeychellesSierra LeoneSingaporeSlovak RepublicSloveniaSolomon IslandsSomaliaSouth AfricaSpainSri LankaSt. HelenaSt. Pierre and MiquelonSt. Vincent and GrenadinesSudanSurinameSvalbard/Jan Mayen Isls.SwazilandSwedenSwitzerlandSyriaTaiwanTajikistanTanzaniaThailandTimor-LesteTogoTokelauTongaTrinidad and TobagoTunisiaTurkeyTurkmenistanTurks/Caicos Isls.TuvaluUgandaUkraineUnited Arab EmiratesUnited KingdomUnited StatesUS Minor Outlying Is.UruguayUzbekistanVanuatuVatican CityVenezuelaViet NamVirgin Islands (British)Virgin Islands (U.S.)Wallis/Futuna Isls.Western SaharaYemenZambiaZimbabweState or Province*--Please Select--Other - not US or CAAlaskaAlabamaArkansasArizonaCaliforniaColoradoConnecticutD.C.DelawareFloridaMicronesiaGeorgiaHawaiiIowaIdahoIllinoisIndianaKansasKentuckyLouisianaMassachusettsMarylandMaineMichiganMinnesotaMissouriMarianasMississippiMontanaNorth CarolinaNorth DakotaNebraskaNew HampshireNew JerseyNew MexicoNevadaNew YorkOhioOklahomaOregonPennsylvaniaRhode IslandSouth CarolinaSouth DakotaTennesseeTexasUtahVirginiaVermontWashingtonWisconsinWest VirginiaWyomingAlbertaManitobaBritish ColumbiaNew BrunswickNewfoundland and LabradorNova ScotiaNorthwest TerritoriesNunavutOntarioPrince Edward IslandQuebecSaskatchewanYukon TerritoryCompany*TitleBusiness Phone*I authorize Vaisala to send me information about relevant products and services. See our Privacy Policy for more details. You can modify your preference settings or unsubscribe at any time here
The post-etch residual polymer removal process cleans polymers from the surface of wafers. This is done in the spray solvent tool, where a commonly used post-etchant chemical, EKC®, is fed to. EKC® post-clean treatments It is very important to keep the EKC® solution in tight specification as too much water in the solution risks corroding the system, and too little water in solution does not efficiently remove the polymers. Vaisala K-PATENTS® Semicon Refractometer offers 2 different control strategies either to automate chemical refilling or automate spiking after each wafer run, and warrant safe wafer production. The semicon refractometer can also alert the potential EKC® traces in IPA before IPA gets contaminated with EKC® in the following IPA/dry process. Fabs can achieve clear benefits using a semicon refractometer: Increase wafer throughput and reduce EKC® consumption. Use a semicon refractometer as a watch-dog for different chemicals and prevent them from mixing. Vaisala’s application note explains how a semicon refractometer can improve process with recommended installation points for best performance. EKC® is a registered trademark of E. I. du Pont de Nemours and Company. Download the application note (PDF) by filling the form. Discover all applications in Fab chemical process monitoring and fault detection Image Email Address*First Name*Last Name*Country*--Please Select--United StatesUnited KingdomCanadaChinaIndiaJapanAustraliaBrazilFranceGermanyFinland--------------AfghanistanÅland IslandsAlbaniaAlgeriaAmerican SamoaAndorraAngolaAnguillaAntarcticaAntigua and BarbudaArgentinaArmeniaArubaAustraliaAustriaAzerbaijanBahamasBahrainBangladeshBarbadosBelarusBelgiumBelizeBeninBermudaBhutanBoliviaBosnia and HerzegovinaBotswanaBouvet IslandBrazilBrit/Indian Ocean Terr.Brunei DarussalamBulgariaBurkina FasoBurundiCambodiaCameroonCanadaCape VerdeCayman IslandsCentral African RepublicChadChileChinaChristmas IslandCocos (Keeling) IslandsColombiaComorosCongoCongo, The Dem. Republic OfCook IslandsCosta RicaCôte D'IvoireCroatiaCubaCyprusCzech RepublicDenmarkDjiboutiDominicaDominican RepublicEcuadorEgyptEl SalvadorEquatorial GuineaEritreaEstoniaEthiopiaFalkland IslandsFaroe IslandsFijiFinlandFranceFrench GuianaFrench PolynesiaFrench Southern Terr.GabonGambiaGeorgiaGermanyGhanaGibraltarGreeceGreenlandGrenadaGuadeloupeGuamGuatemalaGuineaGuinea-BissauGuyanaHaitiHeard/McDonald Isls.HondurasHong KongHungaryIcelandIndiaIndonesiaIranIraqIrelandIsraelItalyJamaicaJapanJordanKazakhstanKenyaKiribatiKorea (North)Korea (South)KuwaitKyrgyzstanLaosLatviaLebanonLesothoLiberiaLibyaLiechtensteinLithuaniaLuxembourgMacauMacedoniaMadagascarMalawiMalaysiaMaldivesMaliMaltaMarshall IslandsMartiniqueMauritaniaMauritiusMayotteMexicoMicronesiaMoldovaMonacoMongoliaMontenegroMontserratMoroccoMozambiqueMyanmarN. Mariana Isls.NamibiaNauruNepalNetherlandsNetherlands AntillesNew CaledoniaNew ZealandNicaraguaNigerNigeriaNiueNorfolk IslandNorthern IrelandNorwayOmanPakistanPalauPalestinian Territory, OccupiedPanamaPapua New GuineaParaguayPeruPhilippinesPitcairnPolandPortugalPuerto RicoQatarReunionRomaniaRussian FederationRwandaSaint Kitts and NevisSaint LuciaSamoaSan MarinoSao Tome/PrincipeSaudi ArabiaSenegalSerbiaSeychellesSierra LeoneSingaporeSlovak RepublicSloveniaSolomon IslandsSomaliaSouth AfricaSpainSri LankaSt. HelenaSt. Pierre and MiquelonSt. Vincent and GrenadinesSudanSurinameSvalbard/Jan Mayen Isls.SwazilandSwedenSwitzerlandSyriaTaiwanTajikistanTanzaniaThailandTimor-LesteTogoTokelauTongaTrinidad and TobagoTunisiaTurkeyTurkmenistanTurks/Caicos Isls.TuvaluUgandaUkraineUnited Arab EmiratesUnited KingdomUnited StatesUS Minor Outlying Is.UruguayUzbekistanVanuatuVatican CityVenezuelaViet NamVirgin Islands (British)Virgin Islands (U.S.)Wallis/Futuna Isls.Western SaharaYemenZambiaZimbabweState or Province*--Please Select--Other - not US or CAAlaskaAlabamaArkansasArizonaCaliforniaColoradoConnecticutD.C.DelawareFloridaMicronesiaGeorgiaHawaiiIowaIdahoIllinoisIndianaKansasKentuckyLouisianaMassachusettsMarylandMaineMichiganMinnesotaMissouriMarianasMississippiMontanaNorth CarolinaNorth DakotaNebraskaNew HampshireNew JerseyNew MexicoNevadaNew YorkOhioOklahomaOregonPennsylvaniaRhode IslandSouth CarolinaSouth DakotaTennesseeTexasUtahVirginiaVermontWashingtonWisconsinWest VirginiaWyomingAlbertaManitobaBritish ColumbiaNew BrunswickNewfoundland and LabradorNova ScotiaNorthwest TerritoriesNunavutOntarioPrince Edward IslandQuebecSaskatchewanYukon TerritoryCompany*TitleBusiness Phone*I authorize Vaisala to send me information about relevant products and services. See our Privacy Policy for more details. You can modify your preference settings or unsubscribe at any time here