Peroxide blending dispense at CMP Chemical mechanical polishing (or planarization), is critical, very costly, and challenging nano polishing process that combines chemical reactions and mechanical abrasion. Polishing is done with a slurry that includes an oxidizing agent, typically hydrogen peroxide H2O2. CMP slurries are mixed or diluted at plant before usage. The correct blend is essential as it is directly linked to chemical reaction rates and wafer polishing rate. Peroxide blending and dispense at CMP Using a Vaisala K-PATENTS® semicon refractometer for measuring CMP slurries’ concentration is essential to achieve proper CMP performance without surface scratching. Vaisala K-PATENTS® semicon refractometer: Is an integratable process metrology device to the blending station. Measures accurately the H2O2 concentration of raw slurry and mixed slurry. Is a continuous, fast, accurate, and in-line device for qualifying CMP slurry compositions. Vaisala’s application note explains how a semicon refractometer can improve process with recommended installation points for best performance. Download the application note (PDF) by filling the form. Discover all applications in Fab chemical process monitoring and fault detection Image Email Address*First Name*Last Name*Country*--Please Select--United StatesUnited KingdomCanadaChinaIndiaJapanAustraliaBrazilFranceGermanyFinland--------------AfghanistanÅland IslandsAlbaniaAlgeriaAmerican SamoaAndorraAngolaAnguillaAntarcticaAntigua and BarbudaArgentinaArmeniaArubaAustraliaAustriaAzerbaijanBahamasBahrainBangladeshBarbadosBelarusBelgiumBelizeBeninBermudaBhutanBoliviaBosnia and HerzegovinaBotswanaBouvet IslandBrazilBrit/Indian Ocean Terr.Brunei DarussalamBulgariaBurkina FasoBurundiCambodiaCameroonCanadaCape VerdeCayman IslandsCentral African RepublicChadChileChinaChristmas IslandCocos (Keeling) IslandsColombiaComorosCongoCongo, The Dem. Republic OfCook IslandsCosta RicaCôte D'IvoireCroatiaCubaCyprusCzech RepublicDenmarkDjiboutiDominicaDominican RepublicEcuadorEgyptEl SalvadorEquatorial GuineaEritreaEstoniaEthiopiaFalkland IslandsFaroe IslandsFijiFinlandFranceFrench GuianaFrench PolynesiaFrench Southern Terr.GabonGambiaGeorgiaGermanyGhanaGibraltarGreeceGreenlandGrenadaGuadeloupeGuamGuatemalaGuineaGuinea-BissauGuyanaHaitiHeard/McDonald Isls.HondurasHong KongHungaryIcelandIndiaIndonesiaIranIraqIrelandIsraelItalyJamaicaJapanJordanKazakhstanKenyaKiribatiKorea (North)Korea (South)KuwaitKyrgyzstanLaosLatviaLebanonLesothoLiberiaLibyaLiechtensteinLithuaniaLuxembourgMacauMacedoniaMadagascarMalawiMalaysiaMaldivesMaliMaltaMarshall IslandsMartiniqueMauritaniaMauritiusMayotteMexicoMicronesiaMoldovaMonacoMongoliaMontenegroMontserratMoroccoMozambiqueMyanmarN. Mariana Isls.NamibiaNauruNepalNetherlandsNetherlands AntillesNew CaledoniaNew ZealandNicaraguaNigerNigeriaNiueNorfolk IslandNorthern IrelandNorwayOmanPakistanPalauPalestinian Territory, OccupiedPanamaPapua New GuineaParaguayPeruPhilippinesPitcairnPolandPortugalPuerto RicoQatarReunionRomaniaRussian FederationRwandaSaint Kitts and NevisSaint LuciaSamoaSan MarinoSao Tome/PrincipeSaudi ArabiaSenegalSerbiaSeychellesSierra LeoneSingaporeSlovak RepublicSloveniaSolomon IslandsSomaliaSouth AfricaSpainSri LankaSt. HelenaSt. Pierre and MiquelonSt. Vincent and GrenadinesSudanSurinameSvalbard/Jan Mayen Isls.SwazilandSwedenSwitzerlandSyriaTaiwanTajikistanTanzaniaThailandTimor-LesteTogoTokelauTongaTrinidad and TobagoTunisiaTurkeyTurkmenistanTurks/Caicos Isls.TuvaluUgandaUkraineUnited Arab EmiratesUnited KingdomUnited StatesUS Minor Outlying Is.UruguayUzbekistanVanuatuVatican CityVenezuelaViet NamVirgin Islands (British)Virgin Islands (U.S.)Wallis/Futuna Isls.Western SaharaYemenZambiaZimbabweState or Province*--Please Select--Other - not US or CAAlaskaAlabamaArkansasArizonaCaliforniaColoradoConnecticutD.C.DelawareFloridaMicronesiaGeorgiaHawaiiIowaIdahoIllinoisIndianaKansasKentuckyLouisianaMassachusettsMarylandMaineMichiganMinnesotaMissouriMarianasMississippiMontanaNorth CarolinaNorth DakotaNebraskaNew HampshireNew JerseyNew MexicoNevadaNew YorkOhioOklahomaOregonPennsylvaniaRhode IslandSouth CarolinaSouth DakotaTennesseeTexasUtahVirginiaVermontWashingtonWisconsinWest VirginiaWyomingAlbertaManitobaBritish ColumbiaNew BrunswickNewfoundland and LabradorNova ScotiaNorthwest TerritoriesNunavutOntarioPrince Edward IslandQuebecSaskatchewanYukon TerritoryCompany*TitleBusiness Phone*I authorize Vaisala to send me information about relevant products and services. See our Privacy Policy for more details. You can modify your preference settings or unsubscribe at any time here
Chemical mechanical polishing (or planarization), is critical, very costly, and challenging nano polishing process that combines chemical reactions and mechanical abrasion. Polishing is done with a slurry that includes an oxidizing agent, typically hydrogen peroxide H2O2. CMP slurries are mixed or diluted at plant before usage. The correct blend is essential as it is directly linked to chemical reaction rates and wafer polishing rate. Peroxide blending and dispense at CMP Using a Vaisala K-PATENTS® semicon refractometer for measuring CMP slurries’ concentration is essential to achieve proper CMP performance without surface scratching. Vaisala K-PATENTS® semicon refractometer: Is an integratable process metrology device to the blending station. Measures accurately the H2O2 concentration of raw slurry and mixed slurry. Is a continuous, fast, accurate, and in-line device for qualifying CMP slurry compositions. Vaisala’s application note explains how a semicon refractometer can improve process with recommended installation points for best performance. Download the application note (PDF) by filling the form. Discover all applications in Fab chemical process monitoring and fault detection Image Email Address*First Name*Last Name*Country*--Please Select--United StatesUnited KingdomCanadaChinaIndiaJapanAustraliaBrazilFranceGermanyFinland--------------AfghanistanÅland IslandsAlbaniaAlgeriaAmerican SamoaAndorraAngolaAnguillaAntarcticaAntigua and BarbudaArgentinaArmeniaArubaAustraliaAustriaAzerbaijanBahamasBahrainBangladeshBarbadosBelarusBelgiumBelizeBeninBermudaBhutanBoliviaBosnia and HerzegovinaBotswanaBouvet IslandBrazilBrit/Indian Ocean Terr.Brunei DarussalamBulgariaBurkina FasoBurundiCambodiaCameroonCanadaCape VerdeCayman IslandsCentral African RepublicChadChileChinaChristmas IslandCocos (Keeling) IslandsColombiaComorosCongoCongo, The Dem. Republic OfCook IslandsCosta RicaCôte D'IvoireCroatiaCubaCyprusCzech RepublicDenmarkDjiboutiDominicaDominican RepublicEcuadorEgyptEl SalvadorEquatorial GuineaEritreaEstoniaEthiopiaFalkland IslandsFaroe IslandsFijiFinlandFranceFrench GuianaFrench PolynesiaFrench Southern Terr.GabonGambiaGeorgiaGermanyGhanaGibraltarGreeceGreenlandGrenadaGuadeloupeGuamGuatemalaGuineaGuinea-BissauGuyanaHaitiHeard/McDonald Isls.HondurasHong KongHungaryIcelandIndiaIndonesiaIranIraqIrelandIsraelItalyJamaicaJapanJordanKazakhstanKenyaKiribatiKorea (North)Korea (South)KuwaitKyrgyzstanLaosLatviaLebanonLesothoLiberiaLibyaLiechtensteinLithuaniaLuxembourgMacauMacedoniaMadagascarMalawiMalaysiaMaldivesMaliMaltaMarshall IslandsMartiniqueMauritaniaMauritiusMayotteMexicoMicronesiaMoldovaMonacoMongoliaMontenegroMontserratMoroccoMozambiqueMyanmarN. Mariana Isls.NamibiaNauruNepalNetherlandsNetherlands AntillesNew CaledoniaNew ZealandNicaraguaNigerNigeriaNiueNorfolk IslandNorthern IrelandNorwayOmanPakistanPalauPalestinian Territory, OccupiedPanamaPapua New GuineaParaguayPeruPhilippinesPitcairnPolandPortugalPuerto RicoQatarReunionRomaniaRussian FederationRwandaSaint Kitts and NevisSaint LuciaSamoaSan MarinoSao Tome/PrincipeSaudi ArabiaSenegalSerbiaSeychellesSierra LeoneSingaporeSlovak RepublicSloveniaSolomon IslandsSomaliaSouth AfricaSpainSri LankaSt. HelenaSt. Pierre and MiquelonSt. Vincent and GrenadinesSudanSurinameSvalbard/Jan Mayen Isls.SwazilandSwedenSwitzerlandSyriaTaiwanTajikistanTanzaniaThailandTimor-LesteTogoTokelauTongaTrinidad and TobagoTunisiaTurkeyTurkmenistanTurks/Caicos Isls.TuvaluUgandaUkraineUnited Arab EmiratesUnited KingdomUnited StatesUS Minor Outlying Is.UruguayUzbekistanVanuatuVatican CityVenezuelaViet NamVirgin Islands (British)Virgin Islands (U.S.)Wallis/Futuna Isls.Western SaharaYemenZambiaZimbabweState or Province*--Please Select--Other - not US or CAAlaskaAlabamaArkansasArizonaCaliforniaColoradoConnecticutD.C.DelawareFloridaMicronesiaGeorgiaHawaiiIowaIdahoIllinoisIndianaKansasKentuckyLouisianaMassachusettsMarylandMaineMichiganMinnesotaMissouriMarianasMississippiMontanaNorth CarolinaNorth DakotaNebraskaNew HampshireNew JerseyNew MexicoNevadaNew YorkOhioOklahomaOregonPennsylvaniaRhode IslandSouth CarolinaSouth DakotaTennesseeTexasUtahVirginiaVermontWashingtonWisconsinWest VirginiaWyomingAlbertaManitobaBritish ColumbiaNew BrunswickNewfoundland and LabradorNova ScotiaNorthwest TerritoriesNunavutOntarioPrince Edward IslandQuebecSaskatchewanYukon TerritoryCompany*TitleBusiness Phone*I authorize Vaisala to send me information about relevant products and services. See our Privacy Policy for more details. You can modify your preference settings or unsubscribe at any time here