Maximize semiconductor quality & yield with smart sensors for measuring trace moisture & wet chemistry

In many phases of the fabrication process, trace moisture can remain after impurities, such as dust, grease, and other polluting elements, have been removed. This can harm product quality and yield. While it’s impossible to completely remove every single water molecule from the process, the aim should be to minimize the presence of water with the help of accurate measurements.

Additionally, wet chemistry processes such as wafer cleaning and etching can benefit greatly from integrated sensors that provide real-time concentration data. Manufacturers can closely monitor chemical baths to ensure they are within pre-set parameters, guaranteeing only the optimal amount of raw material is used. Alarms can also be triggered when concentrations become out of specification before many wafers are impacted, reducing scrap, and maximizing throughput.

What you’ll learn:

• The importance of detecting trace moisture in ultra-high purity gases, the largest source of contamination
• Recommendations for what to look for in dew point instrumentation to ensure accurate measurement results
• How wet chemistries impact wafer and subsequent semiconductor fabrication quality and quantity
• The critical points to monitor with inline sensors to optimize chemical use

Join Vaisala Sales Manager Courtney Erickson and Regional Sales Manager Kevin Green for a technical presentation moderated by Pete Singer, Editor-in-Chief for Semiconductor Digest, to learn how to select the right sensors for accurate, repeatable measurements.

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